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英文名称中文名称CASMF
T-AmyePeroxyPtvalate 過氧化特戊
Tanogitran N-[(1R)-1-[2-[[(4-甲脒基苯基)氨基]甲基]-1-甲基-1H-苯并咪唑-5-基]-1-甲基-2-氧代-2-(1-吡咯烷基)乙基]甘氨酸 637328-69-9 C25H31N7O3
Tannunolide D
Tanomastat (S)-4-(4'-氯联苯-4-基)-4-氧代-2-(苯硫基甲基)丁酸 179545-77-8 C23H19ClO3S
Tanon (fully deuterated)
TAN-1 protein
TAP 29
T3, AP
T4, AP
Tanshinone I 丹参酮 I 568-73-0 C19H18O3
Tanshinone IIA 丹参酮 IIA 568-72-9 C19H18O3
Tanshinones
TANSHINONE OIL
TANSHINONE, DIHYDRO(PRIMARY STANDARD)
TANSHINONE, CRYPTO(PRIMARY STANDARD)
TANSHINONE I (P)
TanshinoneIiaSulfonate
TanshinoneIIB TANSHINONE IIB 17397-93-2 C19H18O4
TanshinoneIIA 丹参酮IIA-磺酸钠 69659-80-9 C19H17O6S.Na
TanshinonellA
TANSHINONEIIA SULFONIC SODIUM
TANSHINONEA SULFONIC SODIUM
TANSHINONE IIA 10-60%
TANSHINONE II A SODIUM SULFONATE
tanshinone VI 121064-74-2
tanshinaldehyde 142694-58-4
TANSHINONE IIA SILATE
TANSHINONE IIB 丹参酮IIB C19H18O4
tantalum trichloride 13569-67-0 Cl3Ta
tantalum tetrachloride 13569-72-7 Cl4Ta
TANTALUM HYDROXIDE) 37349-51-2
TANTALUM 10,000 PPM ICP STANDARD SOLUTION Ta
TANTALUM WIRE, 0.127MM (0.005IN) DIA, 99.9% (METALS BASIS) Ta
TANTALUM POWDER, -100 MESH, PURATRONIC®, 99.98% (METALS BASIS), NB 50PPM Ta
TANTALUM INGOT Ta
TANTALUM OXALATE C10O20Ta2
TANTALUM SLUG, 3.175MM (0.125IN) DIA X 6.35MM (0.25IN) LENGTH, 99.95% (METALS BASIS) Ta
TANTALUM SELENIDE 12039-55-3 Se2Ta
TANTALUM FOIL, 1.5MM (0.06IN) THICK, 99.95% (METALS BASIS) Ta
TANTALUM DIETHYLAMIDE 五(二乙氨基)钽 C20H50N5Ta
TANTALUM STANDARD SOLUTION, 1 MG/ML TA IN 5% HF, FOR AAS Ta
TANTALUM STANDARD SOLUTION Ta
TANTALUM POWDER, -22 MESH, PURATRONIC®, 99.98% (METALS BASIS), NB 50PPM Ta
TANTALUM FOIL, 0.25MM (0.01IN) THICK, ANNEALED, 99.95% (METALS BASIS) Ta
TANTALUM FOIL, 0.7MM (0.03IN) THICK, 99.9% (METALS BASIS) Ta
TANTALUM(V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS) O5Ta2
TANTALUM BOAT, THICKNESS (MM), 0.05, LENGTH (MM), 75 钽舟
TANTALUM PENTA-N-PROPOXIDE C15H35O5Ta
TantalumPentoxid
TantalumRods,99.9% 744-25-7
TantalumTarget
TANTALUM PENTAFLUORIDE 五氟化钽 7783-71-3 F5Ta
TANTALUM - 5% HNO3 + 2% HF 500ML Ta
TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS) O5Ta2
TANTALUM, PLASMA STANDARD SOLUTION, SPECPURE®, TA 10,000µG/ML Ta
TANTALUM POWDER, APS <2 MICRON, 99.9% (METALS BASIS) Ta
TANTALUM GAUZE, 30 MESH WOVEN FROM 0.076MM (0.003IN) DIA WIRE Ta
TANTALUM NITRIDE 氮化钽 12033-62-4 NTa
TANTALUM WIRE, 1.0MM (0.04IN) DIA, ANNEALED, 99.95% (METALS BASIS) Ta
TANTALUM BORIDE 二硼化钽 12007-35-1 B2Ta
TANTALUM(V) OXIDE 氧化钽 1314-61-0 O5Ta2
TantalumAndTitaniumRod,Sheet,Plate
TANTALUM PELLET, 1MM (0.04IN) DIA X 2MM (0.08IN), 99.9% (METALS BASIS) Ta
TANTALUM (V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3 O5Ta2
Tantalum ICP-MS Standard
Tantal(V)nitrid 12033-94-2
TANTALUM (V) ISOPROPOXIDE 五异丙氧基钽 16761-83-4 C15H35O5Ta
TANTALUM TUBING 10MM O.D. X 0.5MM WALL Ta
TANTALUM SLUG, 3.175MM (0.125IN) DIA X 3.175MM (0.125IN) LENGTH, 99.95% (METALS BASIS) Ta
Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis) 碳化钽溅射靶
Tantalum, AAS standard solution, Specpure, Ta 1000μg/ml 钽原子吸收标准溶液
Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) 氧化钽溅射靶
Tantalum Cover for Crucible 35887, 15ml 钽质坩埚盖
Tantalum, plasma standard solution, Specpure, Ta 1000μg/ml 钽等离子吸收标准溶液
tantalus protein
tantalum oxide 59763-75-6
TANTALUMPLASMAEMISSIONSTANDARD,1ML=10MGTA
Tantalum carbide 碳化钽 12070-06-3 CTa
TANTALUM SULFIDE 二硫化钽 12143-72-5 S2Ta
Tantalum(V) bromide Br5Ta
tantalite
TANTALUM (V) IODIDE 碘化钽 14693-81-3 I5Ta
TANTALUM NITRATE N5O15Ta
TANTALUM PENTA-I-BUTOXIDE C20H45O5Ta
TANTALUM(V) TETRAETHOXIDE 2,4-PENTANEDIONATE 四乙醇乙酰丙酮钽 20219-33-4 C13H27O6Ta
TANTALUM ALUMINUM-I-PROPOXIDE C24H56AlO8Ta
TANTALUM(V) TETRAETHOXYDIMETHYLAMIDOETHOXIDE/ 99.99% C60H115N10O35Ta
Tantalum(v)chlorideanhydrous(99.9%-ta)
TANTALUM GAUZE, 50 MESH WOVEN FROM 0.076MM (0.003IN) DIA WIRE Ta
TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS) O5Ta2
TANTALUM - 5% HNO3 + 2% HF 250ML Ta
tantalum(5+) oxalate 31791-37-4 C10O20Ta2
TANTALUM FOIL, 1.0MM (0.04IN) THICK, 99.95% (METALS BASIS) Ta
TANTALUM SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.95% (METALS BASIS EXCLUDING NB) Ta
TANTALUM (V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6 O5Ta2
TANTALUM 1,000 PPM ICP STANDARD SOLUTION Ta
TANTALUM WIRE, 0.5MM (0.02IN) DIA, ANNEALED, 99.95% (METALS BASIS) Ta
Tantalum boride 12653-85-9
TANTALUM (V) ISOPROPOXIDE, 10% W/V IN ISOPROPANOL/HEXANE, 99
TantaliumStandardSolutian 鉭標準液
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